Selective inorganic etchants
Selective inorganic etchants
Selective inorganic etchants
Selective inorganic etchants
Selective inorganic etchants
Selective inorganic etchants
Selective inorganic etchants
Selective inorganic etchants
Selective inorganic etchants
Selective inorganic etchants

Selective inorganic etchants

Selective inorganic etchants for different metals.

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What We Have

In semiconductor fabrications the formulation of metal circuits is processed with various etchants. HIROTA has in-depth knowledge and experience in actions between various metal and chemicals and is able to provide expert solutions through the careful selectivity of different metals.

What It Brings

Etching solution with selectivity (to different rates of corrosion in different metals).

Why Competitive ?

Capability of optimised combination of inorganic chemical action to metals possibly used for fabrication of electric circuits (e.g. Al, Cu, W, Ti, Ni, In, Ga, Pt, Ag, Au etc.), and Si (Silicon) or SiC (Silicon Carbide).

Flexible operation to meet customer needs through diverse product development and small-batch manufacturing.

How To Be Utilized

Speciality acid compounds (titanium-tungsten etchant) for 3D-NAND(as parts for SSD and USB) manufacturing.

Mo(Molybdenum) etchant.

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